THIN FILM DEPOSITION LABORATORY
The Thin Films Lab is equipped with a custom built in-situ stress measurement system built on an optical bench comprising of an Electrochemical Cell, LASER Supply, Beam Splitter, Princeton Applied Research Potentiostat/ Galvanostat Model 273A which is interfaced with LabView. This setup is also equipped with a thermo couple which can be used to monitor the change in stress during annealing. This system is currently being used to measure the stress evolution during the electrodeposition of 2.4T CoFe and NiFe on thin cantilevers. Additional equipment in this lab includes an Induction Heating System (Superior Induction SI 3KWHF).